RICERCA ITALIANA     

FIRB simili:

• 1 - MIcrosistemi sensoriali per Applicazioni estreme ed Ostili (MIAO)
• 2 - Sistemi miniaturizzati per elettronica e fotonica
• 3 - Nanotecnologie e nanodispositivi per la società dell'informazione
• 4 - Sviluppo di microsistemi multisensoriali per applicazioni ambientali e agroalimentari
• 5 - Sviluppo di microsistemi multifunzionali per analisi in diagnostica clinica e nel settore alimentare
• 6 - Microdispositivi Fotonici in Niobato di Litio
• 7 - Sviluppo di metodiche e approcci endovascolari per la diagnosi e la cura della patologia cerebrovascolare, ed esplorazione di nuove tecniche per l'esecuzione di interventi chirurgici a bassissima invasività con l'ausilio della guida robotica.
• 8 - Microtecnologie per la telepresenza immersiva virtuale
• 9 - PIATTAFORME ABILITANTI PER GRIGLIE COMPUTAZIONALI A ELEVATE PRESTAZIONI ORIENTATE A ORGANIZZAZIONI VIRTUALI SCALABILI
• 10 - Nanostrutture molecolari e ibride organiche/inorganiche per fotonica

Classificazione scientifico-disciplinare

• Area scientifico disciplinare: Scienze fisiche
  • FISICA SPERIMENTALE
  • FISICA DELLA MATERIA

Classificazione brevettuale

• ELECTRICITY
  • BASIC ELECTRIC ELEMENTS
    • DEVICES USING STIMULATED EMISSION
  • ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • X-RAY TECHNIQUE (apparatus for radiation diagnosis A61B6/00; X-ray therapy A61N; testing by X-rays G01N; apparatus for X-ray photography G03B; filters, conversion screens, microscopes G21K; X-ray tubes H01J35/00; TV systems having X-ray input H04N5/321)

Classificazione geografica

• Regione: Abruzzo

Bibliografia

1] David Attwood: "Soft X-rays and extreme ultraviolet radiation: principles and applications", Cambridge University Press, 1999.
2] R.H. Stulen and D.W. Sweeney: "Extreme ultraviolet lithography", IEE Journal of Quantum Electronics, Vol. 35, No. 5, pp. 694-699, May 1999.
3] W.T. Silvfast: "Intense EUV incoherent plasma sources for EUV lithography and other applications", IEE Journal of Quantum Electronics, Vol. 35, No. 5, pp. 700-708, May 1999.
4] G.D. Kubiak et al.: "High-power source and illumination system for extreme ultraviolet lithography", Poc. SPIE 3767, pp.136-142, 1999.
5] I.C.E. Turcu et al.: "High power X-ray point source for next generation lithography", SPIE 3767, pp. 21-32, 1999.
6] R. Kodama, "Soft X-ray emission from w0, 2w0, and 4w0 laser produced plasmas", J. Appl. Phys. 59, pp. 3050-, 1986.
7a] H.A. Bender, D. O'Connel and W.T. Silvfast: "Velocity characterization of particulate debris from laser-produced plasmas used for extreme-ultraviolet lithography", Applied Optics, Vol. 34, No. 28, pp. 6513-6521, 1995.
7b] M.S. Schulz, A.G. Michette, and R.E. Burge: "A study of the feasibility of X-ray microscopy with a laser-plasma source", Springer Series in Optical Science, Vol. 67, "X-ray Microscopy III" Int. Conference, Eds.: A. Michette, G. Morrison, and C. Buckley @ Springer-Verlag Berlin Heidelberg , p. 58, 1992.
8] S. Bollanti et al.: "Toward a high average power and debris free soft X-ray source for microlithography, pumped by a long pulse excimer laser", SPIE 3767, pp. 33-44, 1999.
9] M. Wedowski et al.: "Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography", SPIE 3767, pp. 217-224, 1999.
10] H. N. Chapman and K. A. Nugent: "A novel condenser for EUV lithography ring-field projection optics", SPIE 3767, pp. 225-236, 1999.
11] B.L. Henke, E.M. Gullikson and J.C. Davis: "X-ray interactions: photoabsorption, scattering, tyransmission and reflection at E=50-30000 eV, Z=1-92" Atomic Data and Nucl. Data Tables 54, 181 (1993).
12] J. Lindhart and M. Scharff: "Energy dissipation by ions in the keV region", Phys. Rev., Vol. 124, pp. 128-130, 1961.
13] S. Bollanti, R. Cotton, P. Di Lazzaro, F. Flora, T. Letardi, N. Lisi, D. Batani, A. Conti, A. Mauri, L. Palladino, A. Reale, M. Belli, F. Ianzini, A. Scafati, L. Reale, M. A. Tabocchini, P. Albertano, A. Ya, Faenov, T. Pikuz and A. Oesterheld, "Development and characterization of an XeCl excimer laser generated soft X-ray plasma source and its applications", Il Nuovo Cimento 18D(11), pp. 1241-1255, 1996.
14] S. Bollanti, P. Albertano, M. Belli, P. Di Lazzaro, A. Ya. Faenov, F. Flora, G. Giordano, A. Grilli, F. Ianzini, S. V. Kukhlevsky, T. Letardi, A. Nottola, L. Palladino, T. Pikuz, A. Reale, L. Reale, A. Scafati, M. A. Tabocchini, I. C. E. Turcu, K. Vigli-Papadaki and G. Schina, "Soft X-ray plasma source for atmospheric pressure microscopy, radiobiology and other applications", Il Nuovo Cimento 20D, pp. 1685-, 1998.
15] S. Bollanti, T. Letardi, and C. e. Zheng, "Flight range of the particulate in a laser plasma generated soft X-ray chamber", Appl. Phys. A, Vol. 71, pp. 255-260, 2000.
16] T. Letardi, D. Lo, and C.E. Zheng, "Particle dynamics of debris produced during laser plasma soft X-ray generation", J. of Appl. Phys., 9, 2, pp. 1458-1462, 2001.
17] F. Flora, L. Mezi,, C.E. Zheng and F. Bonfigli : "Krypton as stopper for ions and small debris in laser plasma sources", to be published on Europhysics Letters, 2001.
18] G.E. Moore: "Lithography and the future of Moore's low", SPIE2437, 2, 1995.
19] N. Itoh and M. Stoneham, Materials Modification by Electronic Excitation, edited by N. Itoh and M. Stoneham (Cambridge University Press, 2000)
20] R.M. Montereali, S. Bigotta, M. Piccinini, M. Gianmatteo, P. Picozzi, S. Santucci, Nucl. Instr. and Meth. B 166-167, 764 (2000).
21] K. L. Shanklee and R. F. Leheny, Appl. Phys. Lett. 18, 475 (1971).
22]V. A. Kozlov, A. S. Svakhin, and V.V. Ter-Mikirtychev, Electron. Lett. 30, 42 (1994).
23]R.M.Montereali, A.Mancini, S.Martelli, F.Menchini, P.Picozzi, J. Appl. Org. Chem. 15 (2001) 407-413
24]A. Belarouci, F. Menchini, H. Rigneault, B. Jacquier, R.M. Montereali, F. Somma, P. Moretti,,Opt. Comm.189 (2001) 281-287
25]G.Baldacchini and R.M.Montereali, Optical Materials 16 (2001) 53-61
26]R.M.Montereali, M.Piccinini, E.Burattini, Appl.Phys.Lett.78,26 (2001) 4082-4084
27] Nicolosi P.; A. Patelli; M.G. Pelizzo; V. Rigato; G. Maggioni; L. Depero; E. Bontempi; G. Mattei; L. Poletto; P. Mazzoldi; G. Tondello (2001), "First realization and characterization of multilayer EUV reflective coatings", Soft X-ray and EUV imaging systems II SPIE vol. 4506.
28] L. Poletto; Nicolosi P.; G. Tondello (2000), "Stigmatic EUV Spectroscopic System for Emission and Absorption Studies of Laser-produced Plasmas", Instrumentation for UV/EUV Astronomy and Solar missions, SPIE. vol. 4139.

Parole Chiave

microlitografia; plasma; raggi-X molli; EUV; specchi multilayer; optoelettronica